Effect of TiN Addition on the Microstructure and Performance of MoS2-based Composite Films

MoSx-TiN composite films were prepared by magnetron reaction-sputtering. The effect of small amount of TiN on the microstructure and performance of MoS2 -based film was studied. The structure and properties of films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and UMT-2 multi-functional tribometer. Experimental results indicated that, compared with pure MoS2 film, MoSx-TiN composite film had a stronger preferential orientation of crystal plane (002) and a compact microstructure. The MoSx-TiN composite film exhibited better tribological properties than that of pure MoS2 and MoS2-Ti films in humid air at room temperature.