ISSN   1004-0595

CN  62-1224/O4

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原子层沉积氧化铝薄膜摩擦学性能研究

Tribological Properties of Alumina Films Fabricated by Atomic Layer Deposition

  • 摘要: 不同温度条件下,采用原子层沉积(ALD)技术在单晶硅基底表面制备了Al2O3薄膜.利用原子力显微镜观察了Al2O3薄膜的表面形貌和粗糙度,利用纳米压痕仪测定了薄膜的硬度,并通过UMT-2型往复摩擦磨损试验机(球-盘接触方式)考察了制备温度、载荷和对偶球对Al2O3薄膜的摩擦学性能的影响.结果表明:不同温度条件下制备得到的Al2O3薄膜的粗糙度不同;制备温度为100和200 ℃的Al2O3薄膜的摩擦性能较优;在所用载荷范围内,摩擦系数存在最低值;与不同对偶球对摩时,由于对偶球硬度不同,Al2O3薄膜呈现不同的摩擦磨损现象.

     

    Abstract: Alumina films were deposited on silicon substrates at different temperatures using atomic layer deposition. The morphology of the as-prepared film was observed on an atomic force microscope. The hardness and Young's modulus of the films were measured with a nano-indenter. The influence of friction loading and the species of counterpart ball on the tribological properties of alumina films deposited at different temperature were systematically investigated on a UMT-2 tribometer. The results indicate that the alumina films deposited at 100 ℃ and 200 ℃ were smoother with low roughness as compared with the films deposited at 50 ℃ and 300 ℃. It was further detected that the sample with a lower roughness had a lower friction coefficient.The sample tested under applied loads of 50 mN and 80 mN was characterized by a lower friction coefficient as compared with the sample tested under 30 mN and 100 mN. Due to different hardness of the counterpart balls, different wear phenomena were observed on the worn surfaces.

     

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