添加TiN对MoS2基复合薄膜结构和性能的影响

基金项目:

国家自然科学基金项目（50675131）

Effect of TiN Addition on the Microstructure and Performance of MoS2-based Composite Films

1.
1. College of Materials Science and Engineering， Shanghai Jiaotong University， Shanghai 200240， China 2. National Engineering Research Center of Nanotechnology， Shanghai 200241， China
2.
National Engineering Research Center of Nanotechnology， Shanghai 200241， China
3.
College of Materials Science and Engineering， Shanghai Jiaotong University， Shanghai 200240， China

摘要: 通过磁控反应溅射方法制备MoSx-TiN复合薄膜，研究添加少量TiN对MoS2基薄膜结构和性能的影响。薄膜的结构和性能通过X射线光电子能谱仪（XPS）、X射线衍射仪（XRD）、场发射扫描电子显微镜（FESEM）及UMT-2多功能微摩擦磨损试验机等进行了表征。结果表明：与纯MoS2薄膜相比，少量TiN的添加使得MoSx-TiN复合薄膜（002）晶面择优取向且结构致密。与纯MoS2和MoS2-Ti薄膜相比，MoSx-TiN复合薄膜在潮湿大气条件下具有更优异的摩擦磨损性能，更低的摩擦系数。
- MoS2；TiN；磁控反应溅射；摩擦磨损性能
Abstract: MoSx-TiN composite films were prepared by magnetron reaction-sputtering. The effect of small amount of TiN on the microstructure and performance of MoS2 -based film was studied. The structure and properties of films were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and UMT-2 multi-functional tribometer. Experimental results indicated that, compared with pure MoS2 film, MoSx-TiN composite film had a stronger preferential orientation of crystal plane (002) and a compact microstructure. The MoSx-TiN composite film exhibited better tribological properties than that of pure MoS2 and MoS2-Ti films in humid air at room temperature.
- MoS2