ISSN   1004-0595

CN  62-1224/O4

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接触几何参数对硬质薄膜断裂和分层失效行为的影响及其解耦分析

Influences of Contact Geometric Parameters on the Fracture and Delamination Failure Behaviors of Thin Hard Films and Their Decoupling Analysis

  • 摘要: 本文中采用有限元法分析了球头微米压痕过程中弹塑性钢基体上硬质薄膜主应力和膜基界面应力的分布和演化行为,研究了接触几何参数t/R (膜厚/球头半径)对薄膜断裂和分层的影响和作用规律,并探讨了其解耦测试分析指导准则,为膜基系统聚合性能和界面结合性能的表征分析提供了理论指导. 研究结果表明:微米压痕过程3个承载阶段薄膜的主要变形状态分别为弹性平滑变形、弯曲变形和拉伸变形. 薄膜最大拉伸主应力位置当t/R较大(t/R≥0.08)时,始终位于底部弯曲变形区域;当t/R较小(t/R≤0.01)时,则始终位于表面接触区外缘的拉伸变形区域;当0.02≤t/R≤0.067时,该位置将由底部转移到表面,潜在断裂形式由径向裂纹转变为环形裂纹,转变点的临界压入深度和临界应力数值与t/R之间存在线性对应关系. 随着t/R的增大,卸载过程中的最大界面法向应力增加,发生拉伸分层的可能性增加;而随着t/R的增大,界面最大切向应力随之轻微减小,但由于基体的塑性变形,界面切向应力的最大值均接近其剪切屈服强度0.6σys( 1/\sqrt3 σysσys为基体屈服强度). 为避免断裂和分层相互影响,评价界面法向结合性能时应选择较大的t/R;评价界面切向结合性能时,考虑到t/R对界面切向应力影响较小,而t/R较大易触发薄膜断裂,应选择较小的t/R.

     

    Abstract: Film fracture (cohesive failure) and interfacial delamination (adhesive failure) are two main damage modes of thin hard solid films on elastic-plastic steel substrates, and their initiation and propagation processes have complex coupling relationships. Tensile stress concentrations induced by the bending and stretching effects at film surfaces, and concentrations of tensile and shear stresses caused by the mismatch of elastoplastic deformation at the film/substrate interfaces, are the critical reasons for film fracture and interfacial delamination, respectively. Distribution and evolution behaviors of the film principal stress and the interfacial stress during spherical micro-indentations of thin hard films on elastic-plastic steel substrates were analyzed using the finite element method in this article. Influences of the contact geometric parameter t/R (the ratio of film thickness and spherical indenter radius) on the film fracture and the interfacial delamination were investigated, and the guideline of the decoupling analysis for those two failure behaviors were explored, which provided theoretical guidance for the characterizations of the cohesive and adhesive properties of film-substrate systems. Results indicated that the loading process of a micro-indentation test on a film-substrate system could be roughly divided into three main stages according to the position of the maximum plastic deformation of the substrate: film bearing stage (Stage I), film-substrate common bearing stage (Stage II), and substrate bearing stage (Stage III). The deformation states of the film were elastic smooth deformation, bending deformation, and tensile deformation, respectively. For the system with a large t/R (t/R ≥ 0.08), the main bearing stage were Stage I and Stage II, and the maximum tensile principal stress of the film was always located in the bottom bending deformation zone; For the system with a small t/R (t/R ≤ 0.01), the main bearing stage was Stage III, and the maximum tensile principal stress of the film was always located in the surface stretching deformation zone at the outer edge of the contact area; For the system with 0.02 ≤ t/R ≤ 0.067, the main bearing stage transferred from Stage II to Stage III as the indentation depth increase, and the maximum tensile principal stress of the film shifted from the bottom bending zone to the surface stretching zone at the outer edge of the contact area. The potential fracture form changed from radial cracks to ring cracks, and there was a linear corresponding relationship between the critical indentation depth as well as the critical stress of the position transferring point of the main stress (i.e. film potential fracture form) and the parameter of t/R. With the increase of t/R, the maximum normal stress at the interface both increased during the loading and unloading processes, and the possibility of I-type tensile delamination increased, while the maximum tangential stress at the interface slightly decreased. However, due to the substrate plastic deformation, maximum tangential stresses at interfaces were close to its shear yield strength of 0.6σys( 1/\sqrt3 σys, σys is the substrate yield strength). To avoid the coupling influences of fracture and delamination, a larger t/R should be applied to evaluate the normal adhesive performance at interfaces; While to analyze the tangential adhesive properties a smaller t/R was the preference due to the relatively small impact of t/R on tangential stresses at interfaces and the high risk of film cracking caused by a larger t/R.

     

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