Effects of Liquid Nitrogen Shock Chilling on the Performance of Hydrogenated Amorphous Carbon Films
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摘要: 采用等离子增强化学气相沉积系统制备了含氢非晶碳膜. 加热到相应温度(200、250、300、350和400 ℃)后，对薄膜进行液氮激冷处理，并研究其结构、机械及摩擦性能的变化. 结果表明：薄膜硬度在200~300 ℃温度下液氮激冷后，其硬度随热处理温度增加，C-C sp2键逐渐增加；在350~400 ℃温度下液氮激冷处理后，薄膜的硬度逐渐减小，薄膜呈石墨化趋势；而其弹性恢复在整个处理过程(200~400 ℃)中随温度升高持续增大，和C-C sp2键变化趋势一致. 液氮激冷处理后，含氢非晶碳膜的摩擦系数及磨损量均得到改善，在300 ℃激冷处理的含氢非晶碳膜具备最低的摩擦系数及磨损量.Abstract: The hydrogenated amorphous carbon films were deposited by plasma enhanced chemical vapor deposition system. When the films were heated at the objective temperature, the liquid nitrogen was used for shock chilling. The structures, mechanical and frictional performances variation of the hydrogenated amorphous carbon films were investigated. The results suggest that hardness of films gradually increased with liquid nitrogen shock chilling at 200~300 ℃, and decreased liquid nitrogen shock chilling at 350~400 ℃. The elastic recovery and C-C sp2 bond increased in all experiment. The friction coefficients and wear volumes were all reduced after liquid nitrogen shock chilling, particularly under the temperature of 300 ℃ which showed the minimum of friction coefficient and wear volume.
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Keywords:
- a-C:H film /
- shock chilling /
- friction /
- wear /
- thermal stability
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图 2 不同热处理温度下a-C:H薄膜的ID/IG和G峰半峰宽(a)和sp2团簇的尺寸(b)，(c)，(d)和(e)分别是未处理的薄膜、在300 ℃和400 ℃下激冷的薄膜的HRTEM照片
Figure 2. The value of ID/IG and FWHM of G peak (a) and the size of cluster of sp2 (b) of a-C:H films at different heat-treat temperature. The pictures of (c), (d) and (e) are HRTEM figures of untreated, 300 ℃ and 400 ℃, respectively
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图 3 a-C:H薄膜的硬度和弹性恢复(a)和H3/E2的值(b)
Figure 3. Hardness and elastic recovery of a-C:H films (a) and the value of H3/E2 (b)
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图 5 (a)为a-C:H薄膜摩擦系数变化曲线，(b)为a-C:H薄膜稳定阶段的摩擦系数和H3/E2的值
Figure 5. The friction coefficient curve of a-C:H films (a), The steady stage friction coefficient of a-C:H films and the value of H3/E2 of a-C:H films (b)
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图 6 在不同热处理温度下a-C:H薄膜的磨痕截面尺寸,(a)为未处理的薄膜，(b~f)分别为200、250、300、350和400 ℃
Figure 6. The section of frictional cracks for a-C:H films at different heat-treat temperature, a of untreated a-C:H film, b~f of 200 ℃, 250 ℃, 300 ℃, 350 ℃, 400 ℃, respectively
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