ISSN   1004-0595

CN  62-1224/O4

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MoS2/a-C复合薄膜在高/低湿度环境下的摩擦学性能研究

Tribological Properties of MoS2/a-C Composite Films under High/Low Humidity Environments

  • 摘要: 采用磁控溅射方法制备了MoS2薄膜与不同碳含量的MoS2/a-C复合薄膜, 利用XRD、SEM、Raman光谱仪、纳米压痕仪和CSM摩擦试验机等分析了复合薄膜的结构、力学和摩擦学性能. 结果表明: MoS2薄膜为疏松的柱状结构, MoS2/a-C复合薄膜为无定形的致密结构, 硬度较高. 低湿环境下MoS2薄膜与MoS2/a-C复合薄膜的摩擦性能差别不明显; 高湿环境下薄膜的摩擦系数和磨损率均有所升高, 其中MoS2薄膜与低碳含量的MoS2/a-C复合薄膜氧化严重, 而高碳含量的MoS2/a-C复合薄膜的摩擦学性能稳定, 对湿度交替变换的环境适应性更佳. 这是由于碳元素掺杂改善复合薄膜的微观结构, 提高复合薄膜的抗氧化性和力学性能.

     

    Abstract: In this study, the MoS2 film and MoS2/a-C films with two C contents were deposited by unbalanced magnetron sputtering. The structure, mechanical and tribological properties were investigated by X-ray diffraction, scanning electron microscopy, nanoindentor and CSM tribometer. The results show that MoS2 film presented loose columnar structure with well crystalline state, while the MoS2/a-C composite films appeared amorphous state with much dense microstructure. Moreover, the MoS2/a-C composite films possessed relatively higher hardness compared to the MoS2 film. The friction coefficient and wear rate of the films were all found to be very low, and there were no obviously variations with the change of C content under low humidity (RH 15%). However, under high humidity (RH 75%), the friction coefficient of the MoS2 film and the MoS2/a-C composite film with low C content was relatively high and unstable with rather high wear rate as the serious oxidization. The MoS2/a-C composite film with high C content exhibited relatively lower and stable friction coefficient, as well as relatively lower wear rate compared to the MoS2 film and the MoS2/a-C composite film with low C content. The film also provided stable performance and recovery of low friction in multiple humidity cycles. The excellent properties of the MoS2/a-C composite film were attributed to the relatively denser microstructure, high hardness and excellent oxidation resistance properties.

     

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